FUTURE TRENDS AND CONCLUSIONS


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FUTURE TRENDS AND CONCLUSIONS
FUTURE TRENDS AND CONCLUSIONSRadio frequency (RF) plasma generation and application is a critically important technology that is broadly applied throughout semiconductor device manufacturing. Processes that employ RF excitation include PVD, plasma etch and clean and plasma-enhanced chemical vapor deposition (PECVD). Looking toward the future, we first reflect on the past. In the 1980s, the semiconductor industry relied on single-frequency, capacitively coupled plasmas for manufacturing. The 1990s provided an array of technology choices with variants of ECR and ICP chambers. During this time all major etch companies were moving toward high-density plasma chambers. Presently, the CCP chamber appears to be the industry mainstay, with ICP sources increasing their share in etching.
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. FUTURE TRENDS AND CONCLUSIONS, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export