VACUUM PUMPS


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VACUUM PUMPS
VACUUM PUMPS
Pump Basics Vacuum pumps are fundamental to most semiconductor wafer processing technologies (CVD, etching, etc.) by reducing the process chamber pressure to the correct level for the chemistry to proceed, typically in the range of below one to hundreds of mbar (1 millibar = 100 pascals ≈ 9.97 × 10−4 atmospheres). Reduced pressure is required to support the plasmas used in many etch and CVD recipes and helps improve uniformity over the entire wafer surface by increasing the gas velocity over the surface. There has been a general trend of decreasing pressures and increasing flows required as wafer diameters have increased, with the result that pump rotatio…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. VACUUM PUMPS, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export