PROBLEMS RESULTING FROM CHARGE IN CLEANROOMS


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PROBLEMS RESULTING FROM CHARGE IN CLEANROOMS
PROBLEMS RESULTING FROM CHARGE IN CLEANROOMS
Contamination The relationship between electrostatic charge and contamination control in high-technology cleanrooms is a strong one, representing a significant source of particle deposition on charged objects such as wafers. The rate of electrostatic attraction (ESA) of small particles to charged objects has been calculated for a controlled environment,3 and particle deposition data recorded in cleanroom environments have been found to be consistent with the calculation.
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. PROBLEMS RESULTING FROM CHARGE IN CLEANROOMS, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export