STATISTICAL PROCESS CONTROL


Please sign in to view the rest of this entry.

STATISTICAL PROCESS CONTROL
STATISTICAL PROCESS CONTROLTo guarantee that products meet specifications, we measure a substantial number of critical parameters in line during manufacturing. For instance, the thickness of the gate oxide for the fabrication of MOSFET transistors is critical to functionality for multiple reasons [1]. Ideally every transistor has an oxide at the target value thickness (d0), which will ensure it behaves according to the model used for circuit design. In the following, we assume wafers are processed in batches (of, e.g., 25 wafers). Generally, a number of instances of the oxide are measured, using an ellipsometric or x-ray photoelectron spectroscopy (XPS) too…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. STATISTICAL PROCESS CONTROL, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export