METHODOLOGY: DEFECTS, DATA MINING, AND ENHANCEMENTS


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METHODOLOGY: DEFECTS, DATA MINING, AND ENHANCEMENTS
METHODOLOGY: DEFECTS, DATA MINING, AND ENHANCEMENTS
Defect Control Semiconductor factories use defect inspection equipment to scan wafers for defects several times optically or electron-optically during manufacturing. These dark field or bright field inspection tools give the locations of anomalies found on the wafer, but it is a nontrivial task to set up the defect inspection tools such that they actually discover the relevant defects. Sometimes an SEM review at the location reported by a defect inspection tool will not confirm that there is an actual defect at this location, and sometimes actual defects are not detected by the tool. Hence, the sets of de…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. METHODOLOGY: DEFECTS, DATA MINING, AND ENHANCEMENTS, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export