CHEMICAL MECHANICAL POLISHING FILTRATION


Please sign in to view the rest of this entry.

CHEMICAL MECHANICAL POLISHING FILTRATION
CHEMICAL MECHANICAL POLISHING FILTRATIONFiltration for the CMP process is very different from other liquid filtration processes, as the end goal is not to remove all particle contamination, but rather only remove the particle contamination causing defects such as microscratches, and allowing all of the desired slurry particles to pass through the filter. Therefore, selectivity is most critical.Filters for CMP applications have typically utilized melt blown polypropylene fiber filters, which have depth filtration. Melt blown filters are fabricated by extruding, at high temperature, a polymer through specific dies, with the resultant fibers being wound on a mandrel with a core. As the fibers cool, they fuse onto adjoining fibers, forming voids, whi…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. CHEMICAL MECHANICAL POLISHING FILTRATION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export