LITHOGRAPHY FILTRATION


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LITHOGRAPHY FILTRATION
LITHOGRAPHY FILTRATIONWhile the structure of filters used for lithography applications is essentially the same as that used for chemical filtration, some distinct requirements are essential for lithography applications.Many lithography fluids are solvent based, including photoresists, negative tone developers, and adhesion layers, though there are aqueous based fluids including positive tone developer, UPW immersion fluid, and UPW rinses.The polymers used in filters must be compatible with lithography fluids, and also must not leach organics or residues into the solvent-based fluids. This is critical, as any material leaching from the filter that causes line edge roughness, t-topping, or other defects will greatly increase defect rates…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. LITHOGRAPHY FILTRATION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export