REFERENCES


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REFERENCES
REFERENCES M. Ieong, B. Doris, J. Kedzierski, K. Rim, and M. Yang, "Silicon device scaling to the sub-10-nm regime," Science, 306: 2057, 2004. H. Kim, H. Lee, and W. Maeng, "Applications of atomic layer deposition to nanofabrication and emerging nanodevices", Thin Solid Films, 517: 2563, 2009. T. Suntola, "Atomic Layer Epitaxy," Tech. Digest of ICVGE-5, San Diego, 1981. J. Tanskanen, J. Bakke, S. Bent, and T. Pakkanen, "ALD growth characteristics of ZnS films deposited from organozinc and hydrogen sulfide precursors,…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. REFERENCES, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export