REVERSING THE CHEMISTRY: ATOMIC LAYER ETCHING


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REVERSING THE CHEMISTRY: ATOMIC LAYER ETCHING
REVERSING THE CHEMISTRY: ATOMIC LAYER ETCHINGA recent outgrowth of ALD reaction chemistry has involved using the same principle of half reactions to essentially reverse a given deposition reaction to become an etching reaction. Most reactions that occur in ALD are reversible, and the concept of self-limiting surface reactions can be extended to layer-by-layer etching much as is the case for ALD. In atomic layer etch, a surface is exposed to a reactive species which can form a volatile product. After exposure and purging, a surface layer of the volatile etch product is left on the surface. Exposure to low energy ions in a plasma, which would not normally remove the native surface material, can facilitate desorption of the etch products, which are removed from the system le…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. REVERSING THE CHEMISTRY: ATOMIC LAYER ETCHING, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export