HARDWARE CONSIDERATIONS FOR ALD PROCESSING


Please sign in to view the rest of this entry.

HARDWARE CONSIDERATIONS FOR ALD PROCESSING
HARDWARE CONSIDERATIONS FOR ALD PROCESSINGGiven the process similarities between CVD and ALD, the hardware for these processes possess some common characteristics. General chamber, gas handling and pressure control, and vacuum/abatement subsystems are similar. First generation ALD system designs employed a "hot wall" (externally heated) horizontal flow configuration, much like a CVD batch furnace. Later designs added single wafer "down-flow" systems with heated wafer chucks. The use of similar processing chemistries points to similar heating and environmental health and safety issues.On the other hand, the fast cycling nature of the ALD process and the importance of surface-limited half reactions point to several key differences in hardware desig…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. HARDWARE CONSIDERATIONS FOR ALD PROCESSING, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export