THE USE OF PLASMAS IN ALD PROCESSES


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THE USE OF PLASMAS IN ALD PROCESSES
THE USE OF PLASMAS IN ALD PROCESSESWhile the majority of ALD processes are thermally activated, thermodynamics may dictate that a desired reaction pathway or a desired material structure cannot be achieved in a near-equilibrium environment. Plasmas can be used to interrupt thermodynamically favored pathways to enable growth of material phases that cannot be achieved at practical processing conditions.15 Plasmas can also assist in the initial dissociation of the precursor and/or the process co-reactant to allow more efficient growth at relatively low temperature. This is a key advantage for applications where substrate temperature may be limited, such as polymers.
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. THE USE OF PLASMAS IN ALD PROCESSES, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export