INTRODUCTION


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INTRODUCTION
INTRODUCTIONFabricating structures and layers for use in semiconductor and associated applications require the ability to carefully control layer thickness, composition, and structure. These properties in turn play a significant role in the performance of the layers with respect to electrical, chemical, and mechanical characteristics. As semiconductor device dimensions have trended smaller with each device generation, this has resulted in the thickness of the individual constituent layers likewise becoming thinner.1 This evolution fundamentally dictates two outcomes: first, that the ability to control the layer needs to become more precise; and second, that the relationship between the film and the surfa…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. INTRODUCTION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export