OVERVIEW OF MODERN ION IMPLANTATION EQUIPMENT


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OVERVIEW OF MODERN ION IMPLANTATION EQUIPMENT
OVERVIEW OF MODERN ION IMPLANTATION EQUIPMENTNo single architecture can cover the five to six orders of magnitude in energy and dose of the ion implantation application space, due to power/safety concerns, and necessary tradeoffs in process quality, throughput, footprint or size, and also cost. The implant segment was therefore driven to three major equipment types: high current, medium current, and high energy.More recently, ultrahigh-dose implanters have emerged, comprising both plasma ion immersion implantation (PIII) and derivate technologies such as plasma doping (PLAD),17 as well as molecular ion implant using many dopant atom-molecules …
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. OVERVIEW OF MODERN ION IMPLANTATION EQUIPMENT, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export