ACKNOWLEDGMENTS


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ACKNOWLEDGMENTS
ACKNOWLEDGMENTSThe author would like to acknowledge the faculty, staff, and students associated with the Centre for NEMS and Nanophotonics, IIT Madras, in general, and Dr. Shanti Bhattacharya, Dr. T. Sreenidhi, and Ms. Sumi R. in particular, for the data and figures depicting actual etch profiles. Special thanks are due to Mr. Gourab Dutta, research scholar, Department of Electrical Engineering, IIT Madras, for technical assistance, and Prof. Deleep Nair, Department of Electrical Engineering, IIT Madras, for critically reviewing the manuscript.
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. ACKNOWLEDGMENTS, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export