DRY ETCHING


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DRY ETCHING
DRY ETCHINGDry etching is extensively used in today's semiconductor manufacturing. The most important advantage of dry etching is the tailoring of the etch profile. Particularly as the device dimensions have been scaled down, it is necessary to be able to etch through a small window without significant undercut, to achieve smaller and more tightly packed features. Also dry etching process can be easily automated and does not use corrosive etchants like HNO3 or KOH.Dry etching is carried out in a plasma environment and hence is often termed as plasma etching. Plasma is a partially ionized gas with equal number of positive charges (ions) and negative charges (electrons). The degree of ionization is small (~1 in 106). As electrons …
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. DRY ETCHING, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export