WET ETCHING


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WET ETCHING
WET ETCHINGIn the early days of semiconductor processing, wet etching was used exclusively. It is a simple and inexpensive technique. The selectivity is also very good. However, as this etching process is mostly dominated by chemical reaction, only a limited degree of anisotropy can be obtained at best. Further, the substrate is etched in corrosive acid or alkaline solution; the reaction products are also corrosive and hence proper safety protocol must be followed while carrying out wet etching. Moreover, it cannot be easily automated.There are three subprocesses during wet etching: Transfer of etchant species to the substrate surface. This process takes place by the diffusion of reactants through a stagnan…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. WET ETCHING, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export