INTRODUCTION


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INTRODUCTION
INTRODUCTIONEtching, one of the most important process steps in semiconductor technology, essentially means selective removal of material from a given substrate. Etching can be classified in various different ways. Depending on the medium or environment of etching, it can be termed either as "wet" or "dry." In wet etching, the substrate is submerged in an etching solution. A chemical reaction between the substrate and the species in the etching solution takes place and the reaction products (usually soluble in the etching solution) are removed from the substrate. Dry etching is also often termed as plasma etching because here the substrate is exposed to a plasma (partially ionized gas) containing the etching species. The actual mechanism in a dry etching process may be quite diverse as will be discussed l…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. INTRODUCTION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export