LINEWIDTH CONTROL


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LINEWIDTH CONTROL
LINEWIDTH CONTROLHistorically, lithography engineering has focused on two key, complimentary aspects of lithographic quality—overlay performance and linewidth control. Linewidth (or critical dimension, CD) control generally means ensuring that the widths of certain critical features, measured at specific points on those features, fall within acceptable bounds. Overlay describes the positional errors in placing one mask layer pattern over an existing pattern on the wafer. The two types of errors are not independent in their effects on the device. Since the packing density (the closest allowed spacing between devices in a chip) is determined by the accuracy of feature edge placements, both CD control and overlay capability contribute to the design rules that determine packing density. However, by and l…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. LINEWIDTH CONTROL, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export