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PHOTORESIST CHEMISTRYThe formation of an aerial image is only the first step in the transfer of information from a photomask into a resist pattern. The aerial image must propagate into the resist and cause a chemical change, forming a latent image of exposed and unexposed material. This latent image, either directly or indirectly, will affect the solubility of the resist, allowing the latent image to be turned into a profile image through the process of development.
Exposure Kinetics All photoresists have a light sensitive compound called a sensitizer that reacts when exposed to light of a certain wavelength. The chemistry of exposure for diazonaphthoquinone (DNQ, a popular sensitizer for …
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. PHOTORESIST CHEMISTRY, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export