OXIDATIONOXIDATIONOxidation can be considered a special case of annealing in which silicon, or silicon-containing materials, are annealed in an oxygenated ambient to grow an oxidized film. In its simplest form, silicon wafers are exposed to oxygen at elevated temperatures to achieve a silicon oxide (SiO2) film. Figure 7.5 shows the schematic representation of an oxidation process, which differs from anneal only in the oxygen flow. Heat transfer is the most important drive force for oxidation, which make thermal considerations mentioned above in anneals critical to the oxidation process. There is little difference between oxidation in batch furnace and RTP other than the thermal considerations previously discussed.