INTRODUCTION


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INTRODUCTION
INTRODUCTIONSemiconductor devices are created from several different materials combined in precise sequences and patterns. The materials are grown or deposited using specifically controlled ambient (temperature, pressure, and high-purity chemicals). Usually, creating the films involves elevated temperatures and subatmospheric pressures, although many oxidation and anneal processes are at atmospheric pressures. Two types of chemicals used to make the films are inert gases, for example, nitrogen (N2), that do not react with other materials, and reactant gases that decompose into the desired film. Over time, the requirements for processes have changed with device products. Manufacturing economics in terms of cost of ownership (COO) in deference to technical need has also changed the co…
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. INTRODUCTION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export