INTRODUCTION


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INTRODUCTION
INTRODUCTIONIn the past few decades, the demand for high-performance and complex functionality in integrated circuits is primarily met through aggressive device scaling. Device scaling results in smaller and faster transistors and higher integration density on the same chip area. Device scaling has been fulfilling the prophecy of Moore's law, and has been proved to be a very effective solution in many aspects such as performance and cost. At the time when this chapter is written, 14-nm complementary metal-oxide semiconductor transistors have been successfully commercialized and 10-nm transistors are under development. However, the trend of transistor scaling seems to be near saturation. Further transistor scaling will inevitably encounter physical limitations and might not be cost-effective. Another huge …
Citation
Hwaiyu Geng, CMfgE, PE: Semiconductor Manufacturing Handbook, Second Edition. INTRODUCTION, Chapter (McGraw-Hill Professional, 2018 2005), AccessEngineering Export