Multilayer Interference Coatings for EUVL


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Multilayer Interference Coatings for EUVL
Sergiy Yulin Currently, the most advanced lithography tools used in high-volume manufacturing employ a combination of deep ultraviolet (DUV; wavelengths below 300 nm are called deep UV) radiation with a wavelength of 193 nm and an immersion technology to print features with line widths as small as 65 nm. According to the semiconductor industry roadmap, the next standard scales will be 45 nm, followed by 32 and 22 nm. Concurrently, over the last 20 years, many conferences, symposia, and publications have been focusing on postoptical next-generation lithography (NGL). Currently, only one promising…
Citation
Banqiu Wu; Ajay Kumar: Extreme Ultraviolet Lithography. Multilayer Interference Coatings for EUVL, Chapter (McGraw-Hill Professional, 2009), AccessEngineering Export