EUV Optics


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EUV Optics
Bruno La Fontaine For lithography applications, the images to be produced by the optical systems need to be of utmost quality in terms of resolution, contrast, and distortion so that smaller and smaller patterns can be replicated with as much fidelity as possible on pieces of silicon. We will see how extreme ultraviolet (EUV) optics can be used to provide an imaging process that surpasses those using more conventional visible or ultraviolet optics. 10106061010608EUV Optics
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Citation
Banqiu Wu; Ajay Kumar: Extreme Ultraviolet Lithography. EUV Optics, Chapter (McGraw-Hill Professional, 2009), AccessEngineering Export