Foreword


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Foreword
ForewordThe success of Moore’s law, the steady learning curve of cost and productivity improvements in semiconductor device manufacturing, has largely been enabled by the success of optical lithography. And while the limits of optical lithography have been anticipated for decades, no alternative method has reached similar success. At present, only extreme ultraviolet lithography (EUVL) has emerged as the strongest, albeit still highly risky, candidate to succeed optical projection lithography.EUVL systems transfer patterns onto silicon wafers by projecting extreme UV light through a vacuum-contained lens. The most advanced optical lithography tools use a laser with a deep UV (DUV)…
Citation
Banqiu Wu; Ajay Kumar: Extreme Ultraviolet Lithography. Foreword, Chapter (McGraw-Hill Professional, 2009), AccessEngineering Export